Extreme Ultraviolet (EUV) Lithography Market by Equipment (Light Sources, Masks and Optics), End User (Integrated Device Manufacturer (IDM) and Foundry) and Region (Americas, Europe and Asia Pacific) - Global Forecast to 2028
[147 Pages Report] The EUV lithography market is expected to reach USD 25.3 billion by 2028 from USD 9.4 billion in 2023, at a CAGR of 21.8% during the 2023–2028 period. Extreme Ultraviolet Lithography (EUVL) is an advanced semiconductor manufacturing technique used to create integrated circuits (ICs) with smaller feature sizes and higher precision. It is considered one of the key enabling technologies for the continued miniaturization of electronic devices. The core component of EUV lithography is a specialized light source, mask, and optics. This source generates intense pulses of EUV light by converting a high-power laser beam into EUV radiation using a process known as laser-produced plasma. The EUV light is then directed onto a mask, which contains the pattern to be printed onto the silicon wafer.
The EUV mask, also known as a reticle, is like traditional photomasks but has some key differences. It consists of a reflective multilayer coating on a thin silicon substrate. The reflective coating is designed to reflect EUV light while absorbing other wavelengths. The mask pattern is etched into the reflective coating, and when illuminated by EUV light, the pattern is projected onto the silicon wafer. Also, EUV optics play a vital role in shaping, focusing, and directing the intense EUV light used in the lithography process.
Extreme Ultraviolet (EUV) Lithography Market Forecast to 2028
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EUV Lithography Market Dynamics
Driver: Increasing complexity of the integrated circuit.
The increasing complexity of integrated circuits (ICs) refers to the growing demand for semiconductor devices with more intricate and sophisticated designs. As ICs become more advanced, they require finer and more precise lithography techniques to achieve the desired performance and functionality. This complexity is driven by several factors, including the need for higher transistor density, smaller feature sizes, and the integration of new device architectures.
EUV lithography serves as a crucial driver for the market because it enables the fabrication of these complex ICs. EUV lithography technology utilizes extreme ultraviolet light with a shorter wavelength to print smaller and more intricate patterns on semiconductor wafers. With its superior resolution and better control over critical dimensions, EUV lithography allows semiconductor manufacturers to achieve the required precision and accuracy for advanced IC designs.
As the complexity of ICs increases, traditional lithography techniques face limitations in terms of resolution and pattern fidelity. EUV lithography overcomes these limitations, providing the capability to print smaller features and tighter patterns. This is particularly important for manufacturing high-performance chips used in applications such as artificial intelligence, 5G connectivity, data centers, and autonomous vehicles.
Restraint: High cost of implementing EUV Lithography system.
The high cost associated with implementing EUV lithography is a significant restraining factor. The technology requires the development of expensive and complex equipment, including EUV light sources, masks, and photoresists. The current cost of EUV lithography machines is several times higher than traditional optical lithography tools. This cost factor presents a barrier for smaller semiconductor manufacturers or foundries that may not have the financial resources to adopt EUV lithography technology. EUV lithography requires specialized and complex equipment, which significantly contributes to the high implementation cost. Key components include EUV light sources, masks (reticles), photoresists, and scanners. These components are expensive to develop, manufacture, and maintain. In comparison with masks used in traditional optical lithography, EUV masks are more intricate and expensive to produce.
Opportunity: Advanced memory development for next-generation memory devices.
The expansion of EUV (Extreme Ultraviolet) lithography in memory manufacturing presents a significant opportunity for the EUV lithography market. Memory devices, such as DRAM (Dynamic Random Access Memory) and NAND Flash, play a crucial role in various electronic devices, including computers, smartphones, and data centers. As memory technology advances, there is a growing demand for higher capacity, faster, and more energy-efficient memory solutions. EUV lithography offers unique advantages that make it an attractive option for the production of advanced memory devices.
EUV lithography's ability to deliver high-resolution imaging and precise patterning enables the creation of smaller and denser memory cells. This is particularly important in the context of next-generation memory technologies, such as EUV-based DRAM and 3D NAND Flash. By using EUV lithography, memory manufacturers can overcome the limitations of traditional optical lithography, which struggles to achieve the necessary resolution and pattern fidelity for advanced memory designs.
One of the main advantages of EUV lithography in memory manufacturing is its ability to pattern complex three-dimensional structures. EUV lithography can contribute to the development of advanced DRAM technologies, such as EUV-based High Bandwidth Memory (HBM). HBM offers significantly higher bandwidth and improved power efficiency compared to traditional memory solutions. By utilizing EUV lithography, memory manufacturers can fabricate the intricate interconnects and through-silicon vias (TSVs) required in HBM, enabling higher memory bandwidth and improved performance in applications like graphics processing units (GPUs) and artificial intelligence (AI) accelerators.
Challenge: Source power and productivity in EUV lithography act as a challenge for the market
Source power and productivity are significant challenges in the EUV (Extreme Ultraviolet) lithography market. The source power refers to the intensity of the EUV light generated by the light source used in the lithography system. It directly influences the speed and efficiency of the lithography process, while productivity refers to the overall throughput and capacity of the system to process wafers.
The availability of high-source power is crucial for achieving faster exposure times and higher wafer throughput, which are essential for meeting the demands of high-volume semiconductor manufacturing. Higher source power allows for more efficient exposure, reducing the time it takes to expose each individual wafer and increasing the number of wafers processed per unit of time.
Achieving and maintaining high source power in EUV lithography systems is a significant technical challenge. Generating stable and reliable EUV light at the required power levels is complex and requires advanced technologies. Additionally, maintaining the source power over extended periods of operation without degradation is a continuous challenge.
EUV Lithography Market Ecosystem
The prominent players in the EUV lithography market are ASML (Netherlands), Carl Zeiss AG(Germany), TOPPAN Inc. (Japan), HOYA Corporation (Japan), TRUMPF (Germany), and KLA Corporation (US). These companies not only boast a comprehensive product portfolio of EUV lithography but also have a strong geographic footprint.
The EUV light source holds the largest market share of the equipment segment in the EUV lithography market during the forecast period
The EUV Lithography light source is a crucial component used in the semiconductor industry's EUV lithography systems. Currently, the primary method for generating EUV light is through laser-produced plasma (LPP) technology. ASML, a prominent semiconductor equipment manufacturer, has developed a notable LPP EUV light source. This particular light source utilizes a high-power pulsed laser to irradiate tin (Sn) droplets or a thin tin film. The laser's energy causes rapid heating and vaporization of the tin material, creating plasma. As the plasma cools and recombines, it emits EUV light with a wavelength of approximately 13.5 nanometers. ASML, Ushio Inc., Energetiq Technology Inc., and TRUMPF are among the companies providing EUV lithography light sources.
Foundry holds the largest market share of the EUV lithography market in 2023
A foundry is a specialized manufacturing facility that offers semiconductor fabrication services to semiconductor companies or integrated device manufacturers (IDMs). Foundries focus exclusively on the manufacturing aspect of the semiconductor industry and do not involve themselves in chip design. The role of foundries in the semiconductor industry is crucial as they provide manufacturing services to companies that lack their own fabrication facilities or choose to outsource their chip production. Fabless companies and IDMs collaborate with foundries to transfer their chip designs, known as intellectual property (IP), to the foundry for fabrication. Well-known foundries that provide semiconductor manufacturing services, including EUV lithography, include Taiwan Semiconductor Manufacturing Company Limited, GlobalFoundries, Samsung Foundry, and others.
Asia Pacific is expected to register the highest market share during the forecast period.
The Asia Pacific region holds immense significance in the field of EUV (Extreme Ultraviolet) lithography, an advanced technology used in semiconductor manufacturing. When analyzing the EUV lithography market in this region, countries such as China, Japan, Taiwan, South Korea, and the rest of Asia Pacific are taken into consideration. These nations have made substantial investments in the development and implementation of EUV lithography technology. They have established state-of-the-art semiconductor fabrication facilities and research institutes that focus on advancing the capabilities of EUV lithography. The strong presence of these countries in the semiconductor industry creates a high demand for EUV lithography, thereby driving its ongoing development and optimization.
Moreover, the Asia Pacific region boasts a large consumer electronics market, encompassing smartphones, tablets, and various electronic devices. The growing need for smaller, faster, and more energy-efficient semiconductors is propelling the adoption of advanced lithography technologies like EUV. EUV lithography enables the production of high-density and high-performance chips, which are essential for meeting the demands of the consumer electronics market in the Asia Pacific region. Additionally, this region serves as a major hub for semiconductor equipment manufacturing companies such as TOPPAN Inc., NTT Advanced Technology Corporation, ADVANTEST CORPORATION, Ushio Inc., AGC Inc., Lasertec Corporation, and NuFlare Technology etc.
Extreme Ultraviolet (EUV) Lithography Market by Region
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Key Market Players
The major players in the EUV lithography companies include ASML (Netherlands), Carl Zeiss AG(Germany), TOPPAN Inc.(Japan), NTT Advanced Technology Corporation(Japan), KLA Corporation(US), ADVANTEST CORPORATION(Japan), Ushio Inc.(Japan), SUSS MicroTec SE(Germany), AGC Inc.(Japan), Lasertec Corporation(Japan), NuFlare Technology(Japan), Energetiq Technology Inc.(US), Photronics, Inc.(US), HOYA Corporation(Japan), TRUMPF(Germany), Rigaku Corporation(Japan), Edmund Optics Ltd.(US), Park Systems(Korea), Zygo Corporation(US), Imagine Optic(US) and Applied Materials, Inc.(US).
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Report Metric |
Details |
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Market size available for years |
2019–2028 |
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Base year considered |
2022 |
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Forecast period |
2023–2028 |
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Forecast units |
Value (USD Million/Billion), Volume (Million Units) |
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Segments Covered |
By Equipment, By End User, and By Region |
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Geographies covered |
Americas, Europe, and Asia Pacific |
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Companies covered |
The major players in the EUV lithography market are ASML (Netherlands), Carl Zeiss AG(Germany), TOPPAN Inc.(Japan), NTT Advanced Technology Corporation(Japan), KLA Corporation(US), ADVANTEST CORPORATION(Japan), Ushio Inc.(Japan), SUSS MicroTec SE(Germany), AGC Inc.(Japan), Lasertec Corporation(Japan), NuFlare Technology(Japan), Energetiq Technology Inc.(US), Photronics, Inc.(US), HOYA Corporation(Japan), TRUMPF(Germany), Rigaku Corporation(Japan), Edmund Optics Ltd.(US), Park Systems(Korea), Zygo Corporation(US), Imagine Optic(US) and Applied Materials, Inc.(US). |
Extreme Ultraviolet (EUV) Lithography Market Highlights
The study segments the EUV lithography market based on equipment, end user, and region at the regional and global levels.
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Segment |
Subsegment |
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By Equipment |
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By End User |
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By Region |
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Recent Developments
- In January 2022, ASML announced the last phase of collaboration with Intel Corporation to drive High- NA into manufacturing in 2025. The main objective is to advance the cutting edge of semiconductor lithography technology. The first purchase order issued by Intel Corporation to ASML for the delivery of the industry’s first TWINSCAN EXE:5200 system – an extreme ultraviolet (EUV) high-volume production system with a more than 200 wafers per hour productivity and huge numerical aperture and – as part of their long-term High-NA collaboration framework.
- In December 2022, Carl Zeiss AG developed a dedicated optical system exclusively for EUV lithography, which functions within a vacuum environment and exclusively employs mirrors. This entire system stands at approximately one and a half meters tall, weighs around 3.5 tons, and encompasses over 35,000 individual components.
Frequently Asked Questions (FAQ):
What is the current size of the global EUV lithography market?
The EUV lithography market is estimated to be USD 25.3 billion by 2028 from USD 9.4 billion in 2023, at a CAGR of 21.8% during the 2023–2028 period.
Who are the winners in the global EUV lithography market?
Companies such as ASML (Netherlands), Carl Zeiss AG(Germany), TOPPAN Inc. (Japan), HOYA Corporation (Japan), TRUMPF (Germany), and KLA Corporation (US).
Which region is expected to hold the highest market share?
Asia Pacific is expected to dominate the EUV lithography market during the forecast period.
What are the major drivers and opportunities related to the EUV lithography market?
The driver for the market is the increased demand for HPC (high-performance computing) leads to an increase in the demand for EUV lithography. And the opportunity for the market is Elevating photonics and optics manufacturing with advanced patterning technologies.
What are the major strategies adopted by market players?
The key players have adopted product launches, acquisitions, collaborations, and partnerships to strengthen their position in the EUV lithography market.
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The research report includes four major activities, estimating the size of the EUV lithography market. Secondary research has been done to gather important information about the market and peer markets. To validate the findings, assumptions, and sizing with the primary research with industry experts across the value chain is the next step. Both bottom-up and top-down approaches have been used to estimate the market size. After this, the market breakdown and data triangulation have been adopted to estimate the market sizes of segments and sub-segments
Secondary Research
In the secondary research process, various sources have been referred to for identifying and collecting information for this study on the EUV lithography market. Secondary sources considered for this research study include government sources; corporate filings (such as annual reports, investor presentations, and financial statements); and trade, business, and professional associations. Secondary data has been collected and analyzed to determine the overall market size, further validated through primary research. Secondary research has been mainly used to obtain key information about the supply chain of the EUV lithography industry to identify the key players based on their products and the prevailing industry trends in the EUV lithography market based on equipment, end-users, and region. It also includes information about the key developments undertaken from both market- and technology-oriented perspectives.
Primary Research
In the primary research process, various primary sources have been interviewed to obtain qualitative and quantitative information related to the market across four main regions-Asia Pacific, Europe, and the Americas. Primary sources from the supply side include industry experts such as CEOs, vice presidents, marketing directors, technology directors, and a few other related key executives from major companies and organizations operating in the EUV lithography market or related markets.
After the completion of market engineering, primary research was conducted to gather information and verify and validate critical numbers obtained from other sources. Primary research has also been conducted to identify various market segments; industry trends; key players; competitive landscape; and key market dynamics, such as drivers, restraints, opportunities, and challenges, along with the key strategies market players adopt. Most of the primary interviews have been conducted with the supply side of the market. This primary data has been collected through questionnaires, emails, and telephonic interviews.
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Market Size Estimation
The top-down and bottom-up approaches have been used extensively in market engineering. Several data triangulation methods have also been used to perform market forecasting and estimation for the report’s overall market segments and sub-segments. Multiple qualitative and quantitative analyses have been performed on the market engineering process to gain key insights throughout the report.
Secondary research has been used to identify the key players offering EUV lithography. The revenues of those key players have been determined through both primary and secondary research. The revenues have been identified geographically as well as market segment-wise, using financial statements and analyzing annual reports of the key market players. Interviews with CEOs, VPs, directors, and marketing executives have also been conducted to gain insights into the key players and the EUV lithography market. All the market shares have been estimated using secondary and primary research. This data has been consolidated, supplemented with detailed inputs and analysis from MarketsandMarkets, and presented in this report.
Market Size Estimation Methodology-Bottom-up Approach
The bottom-up approach has been employed to arrive at the overall size of the EUV lithography market from the calculations based on the revenues of the key players and their shares in the market. Key players in the EUV lithography market have been studied. ASML is the sole manufacturer of EUV lithography systems. However, we have also studied the different equipment manufacturers in the market. The market size estimations have been carried out considering the market size of their EUV lithography system offerings.
In the top-down approach, the overall market size has been used to estimate the size of individual markets through percentage splits from secondary and primary research. The most appropriate parent market size has been used to implement the top-down approach for the calculation of specific market segments. The revenue shares used earlier in the bottom-up approach were verified by identifying and estimating the market share for each company. The overall parent market size and individual market sizes have been determined and confirmed in this study through the data triangulation process and data validation through the primaries.
Data Triangulation
After arriving at the overall market size from the market size estimation process explained above, the total market has been then split into several segments and sub-segments. Data triangulation has been employed to complete the market engineering process and arrive at the exact statistics for all segments and sub-segments. The data has been triangulated by studying various factors and trends from both the demand and supply sides. Along with this, the market has been validated using both the top-down and bottom-up approaches.
Market Definition
Extreme Ultraviolet Lithography (EUV lithography) is an advanced semiconductor manufacturing technique used to create smaller and more powerful computer chips. It utilizes a highly energetic form of light known as extreme ultraviolet (EUV) light, with a wavelength of around 13.5 nanometers, enabling the production of extremely fine features on silicon wafers. EUV lithography plays a crucial role in enabling the continued miniaturization of transistors and the increasing complexity of integrated circuits. The latest EUV lithography machines can achieve resolution down to 5 nanometers, allowing chip manufacturers to produce cutting-edge processors with enhanced performance and energy efficiency.
Key Stakeholders
- Companies in the EUV lithography market in the future
- Companies involved in the ecosystem of semiconductor manufacturing.
- Key equipment suppliers of lithography systems
- Key customers of semiconductor manufacturers in the fields of advanced packaging and microchip development
- Government, financial, and research institutions, as well as investment communities
- Analysts and strategic business planners
- Research and consulting firms
The main objectives of this study are as follows:
- To define, describe, and forecast the EUV (extreme ultraviolet) lithography market based on the end user, by equipment, and region.
- To forecast the market size for various segments with regard to 3 main regions, namely Asia Pacific, Americas, and Europe.
- To forecast the shipments of EUV lithography from 2023 to 2028.
- To provide detailed information regarding the key factors such as drivers, restraints, opportunities, and challenges influencing the growth of the market
- To provide detailed analysis of the market ecosystem, technology analysis, pricing analysis, revenue shift, Porter’s five forces model, key stakeholders & buying criteria, case study analysis, trade analysis, patent analysis, key conferences & events, and tariff and regulations related to the EUV lithography market.
- To analyze the micro markets with regard to industry trends, prospects, and contribution to the overall market
- To analyze opportunities in the market for stakeholders by identifying high-growth segments of the EUV lithography market and provide details of the competitive landscape for market leaders.
- To strategically profile the key players and key equipment manufacturers and comprehensively analyze their market share and core competencies, along with a detailed competitive landscape for the market leaders.
- To study the complete value chain and allied industry segments, as well as perform a value chain analysis of the EUV lithography landscape.
- To track and analyze the competitive developments, such as joint ventures, mergers and acquisitions, new product developments, and research and development activities in the EUV lithography market.
Available Customizations:
With the given market data, MarketsandMarkets offers customizations according to the specific requirements of companies. The following customization options are available for the report:
- Country-wise Information for Asia Pacific
- Detailed analysis and profiling of additional market players (up to five)
Growth opportunities and latent adjacency in Extreme Ultraviolet (EUV) Lithography Market